Defect Prediction in Optical Lithography, EUVL, and NIL (National Taiwan University)

National Taiwan University researchers published a technical paper titled “From Lithography to Nanoimprint: Physics-Based, Data-Driven, and Hybrid Frameworks for Defect Prediction in Advanced Patterning Technologies.” Abstract: “Advanced patterning technologies have evolved from direct optical image transfer into predictive manufacturing frameworks in which defects are shaped by imaging physics, material response, process variation, and computational correction.... » read more